Yokosuka, Japan

Mitsuaki Uesugi


Average Co-Inventor Count = 4.0

ph-index = 7

Forward Citations = 205(Granted Patents)


Location History:

  • Yokohama, JP (1985 - 1987)
  • Kanagawa, JP (1989 - 1992)
  • Tokyo, JP (1989 - 2003)
  • Yokosuka, JP (2007 - 2009)

Company Filing History:


Years Active: 1985-2009

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13 patents (USPTO):Explore Patents

Title: Mitsuaki Uesugi: Innovator in Defect Marking Technology

Introduction

Mitsuaki Uesugi is a notable inventor based in Yokosuka, Japan. He has made significant contributions to the field of defect marking technology, holding a total of 13 patents. His work focuses on improving the accuracy and efficiency of flaw detection in metal strips.

Latest Patents

One of Uesugi's latest patents is a method for marking defects and the corresponding device. This defect marking device includes a flaw inspection system equipped with multiple light-receiving parts. These parts identify reflected lights from the inspection plane of a metal strip under various optical conditions. The signal processing section of the device assesses the presence or absence of surface flaws based on the combination of reflected light components. Additionally, the marking device applies markings that convey information related to the identified flaws on the surface of the metal strip.

Career Highlights

Throughout his career, Mitsuaki Uesugi has worked with prominent companies such as NKK Corporation and Nippon Kokan Kabushiki Kaisha. His experience in these organizations has allowed him to develop innovative solutions in defect marking technology.

Collaborations

Uesugi has collaborated with several professionals in his field, including Masaichi Inomata and Tsutomu Kawamura. These collaborations have contributed to the advancement of his inventions and the overall progress in defect marking technology.

Conclusion

Mitsuaki Uesugi's contributions to defect marking technology demonstrate his innovative spirit and dedication to improving industrial processes. His patents reflect a commitment to enhancing flaw detection methods, making a significant impact in his field.

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