Ming-Shuoh Liang

Title: The Innovations of Ming-Shuoh Liang

Introduction

Ming-Shuoh Liang is a prominent inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on improving integrated circuit devices and interconnect structures, which are crucial for modern electronics.

Latest Patents

Liang's latest patents include innovative methods and structures that enhance the performance and efficiency of semiconductor devices. One of his notable patents is for an interconnect structure and method of forming the same. This invention features a damascene structure, an inter-metal dielectric (IMD), a dielectric block, and a metal via, which work together to create a more effective interconnect system. Another significant patent involves methods of fabricating integrated circuit devices with reduced line end spaces. This method outlines a detailed process for depositing dielectric layers and hard masks, ultimately leading to the formation of conductive lines that improve device functionality.

Career Highlights

Throughout his career, Ming-Shuoh Liang has worked with leading companies in the semiconductor industry. He has been associated with Taiwan Semiconductor Manufacturing Company Ltd. and Advanced Semiconductor Engineering, Inc. These experiences have allowed him to apply his innovative ideas in practical settings, contributing to advancements in semiconductor technology.

Collaborations

Liang has collaborated with several talented individuals in his field, including Jye-Yen Cheng and Chen-Yu Shyu. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.

Conclusion

Ming-Shuoh Liang's contributions to semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry, paving the way for future innovations in integrated circuit design.