Location History:
- Tai-tung, TW (1999 - 2001)
- Hsin-Chu, TW (2003 - 2005)
- Pingchen, TW (2006 - 2008)
Company Filing History:
Years Active: 1999-2008
Title: The Innovations of Ming-Shuo Yen
Introduction
Ming-Shuo Yen is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 10 patents. His work focuses on advanced fabrication techniques that enhance the efficiency and performance of semiconductor devices.
Latest Patents
One of his latest patents is titled "Dual trench alternating phase shift mask fabrication." This invention discloses a method for fabricating a dual-trench alternating phase shift mask (PSM). The process involves a chromium layer over a mask layer, which is situated above a quartz layer of the PSM. The chromium layer is patterned according to a semiconductor design. The mask layer undergoes dry etching based on deep trenches of the PSM design. Subsequently, the quartz layer is dry etched multiple times through a photoresist layer applied over the chromium layer, utilizing backside ultraviolet exposure. The mask layer is then dry etched again according to shallow trenches of the PSM design, followed by additional dry etching of the quartz layer through a second photoresist layer.
Career Highlights
Ming-Shuo Yen is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His innovative work has positioned him as a key figure in advancing semiconductor fabrication techniques.
Collaborations
He has collaborated with notable coworkers, including Wen-Hsiang Tang and Pei-Hung Chen, contributing to various projects that push the boundaries of semiconductor technology.
Conclusion
Ming-Shuo Yen's contributions to semiconductor fabrication through his patents and collaborations highlight his role as an influential inventor in the industry. His work continues to impact the development of advanced semiconductor technologies.