The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 23, 2003
Filed:
Oct. 30, 2002
Hsien-Tsong Chen, Junghe, TW;
Ming-Shuo Yen, Hsinchu, TW;
Woan Tyng Hwang, Kaohsiung, TW;
Yu-Chang Chen, Pingtung, TW;
Tien-Tzu Wen, Hsinchu, TW;
Shion-Feng Chang Chien, Kaoshiung, TW;
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Abstract
A method of early and effective detection of defects in a metal patterning process is described. A test keys structure is provided comprising a plurality of test keys in scribe lines of a control monitor wafer wherein more than 300 test keys are formed on a control monitor wafer and wherein each of the plurality of test keys has an area of at least 10 &mgr;m . A metal layer is deposited on the control monitor wafer. A dielectric layer is deposited overlying the metal layer. Thereafter, the control monitor wafer is tested using the plurality of test keys.