Company Filing History:
7 out of 7,087 
1 out of 832,880 Years Active: 2007-2012
Title: **An Overview of Inventor Min-Chieh Yang**
Introduction
Min-Chieh Yang is a prominent inventor based in Kaohsiung, Taiwan. With a remarkable portfolio of eight patents, he has made significant contributions to the field of semiconductor technology. His innovative methodologies are paving the way for advancements in the fabrication of semiconductor devices, reflecting his commitment to enhancing industry standards.
Latest Patents
Min-Chieh Yang's latest patents showcase his expertise and creativity. One such patent is the **Method for Increasing the Removal Rate of Photoresist Layer**. This invention provides a method that involves pre-treating a substrate, utilizing processes such as plasma treatment, prior to applying the photoresist layer. This approach significantly increases the removal rate of the photoresist layer, essential for effective semiconductor device fabrication.
Another noteworthy patent is the **Patterning Method Using Stacked Structure**. This invention offers a novel stacked structure designed for patterning a material layer. It allows the formation of an opening pattern with a predetermined width in the layer. The structure comprises an underlayer, a silicon-rich organic layer, and a photoresist layer, optimizing thickness for better performance in patterning applications.
Career Highlights
Throughout his career, Min-Chieh Yang has been associated with various esteemed companies, notably working at United Microelectronics Corporation. His expertise in semiconductor technology has enabled him to develop a strong foundation in innovative practices and methods throughout his tenure in the industry, contributing to several groundbreaking patents.
Collaborations
Min-Chieh has collaborated with esteemed colleagues, including Jiunn-Hsiung Liao and Lung-En Kuo. These collaborations have undoubtedly enriched his work and expanded the scope of his inventions, fostering a creative environment for innovation in semiconductor technology.
Conclusion
In conclusion, Min-Chieh Yang stands out as a notable inventor in the field of semiconductor technology. His innovative patents, such as those focusing on photoresist layers and patterning methods, are instrumental in enhancing the manufacturing processes of semiconductor devices. As he continues his work, his contributions are likely to have lasting impacts on the industry, shaping the future of technology.