The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 14, 2010
Filed:
Sep. 25, 2007
Lung-en Kuo, Chiayi County, TW;
Jiunn-hsiung Liao, Tainan County, TW;
Min-chieh Yang, Kaohsiung, TW;
Lung-En Kuo, Chiayi County, TW;
Jiunn-Hsiung Liao, Tainan County, TW;
Min-Chieh Yang, Kaohsiung, TW;
United Microelectronics Corp., Hsinchu, TW;
Abstract
A patterning method is provided. In the patterning method, a film is formed on a substrate and a pre-layer information is measured. Next, an etching process is performed to etch the film. The etching process includes a main etching step, an etching endpoint detection step, an extension etching step and an over etching step. An extension etching time for performing the extension etching step is set within 10 seconds based on a predetermined correlation between an extension etching time and the pre-layer information, so as to achieve a required film profile.