Min-Chieh Yang

Title: Min-Chieh Yang: Innovator in Etching Technologies

Introduction

Min-Chieh Yang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in etching technologies. With a total of 10 patents to his name, Yang has developed innovative solutions that enhance the efficiency and selectivity of etching processes.

Latest Patents

Among his latest patents, Yang has introduced selective etchant compositions and methods. This invention relates to compositions and methods for selectively etching silicon nitride in the presence of silicon oxide, polysilicon, and/or metal silicides at a high etch rate and with high selectivity. The patent describes additives that can be utilized at various dissolved silica loading windows to maintain the high selective etch rate and selectivity. Another notable patent is for a method for removing hard masks. This invention provides compositions and methods useful in etching, specifically for removing amorphous carbon hard masks that have been doped with elements such as boron, chlorine, or nitrogen. The compositions utilize concentrated sulfuric acid, water, and at least one oxidizing agent, allowing for selective removal of the doped hard mask layer even in the presence of other layers like silicon dioxide and silicon nitride.

Career Highlights

Throughout his career, Min-Chieh Yang has worked with notable companies in the semiconductor industry, including Entegris, Inc. and Winbond Electronics Corporation. His work has significantly impacted the development of advanced etching techniques that are crucial for modern semiconductor fabrication.

Collaborations

Yang has collaborated with several professionals in his field, including Hsing-Chen Wu and Emanuel Israel Cooper. These collaborations have contributed to the advancement of etching technologies and the successful implementation of his patented methods.

Conclusion

Min-Chieh Yang's innovative contributions to etching technologies have established him as a key figure in the semiconductor industry. His patents reflect a commitment to enhancing manufacturing processes, making significant strides in the field.