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For the Inventor, By the Inventor

Nirasaki, Japan

Mikio Sato

This inventor holds 12 USPTO granted patents and 2 published patent applications. Top assignee: Tokyo Electron Limited. Active years: 2021-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Mikio Sato. Retrieved from https://idiyas.com/inventor/mikio-sato-ah24co6q

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 12 

% Patents Active = 100.0

Average Co-Inventor Count = 3.5

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Yamanashi, JP (2021 - 2023)
  • Nirasaki, JP (2022 - 2024)

Company Filing History:

goldMedal12 out of 10,933 
 
Tokyo Electron Limited
 patents

Years Active: 2021-2025

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12 patents (USPTO):Explore Patents
1. 12243718 - Plasma processing method and plasma processing apparatus (2025-03-04),
2. 12237157 - Plasma measurement method (2025-02-25),
3. 11967485 - Plasma processing apparatus and plasma processing method (2024-04-23),
4. 11887825 - Control method and plasma processing apparatus (2024-01-30),
5. 11749511 - Plasma observation system and plasma observation method (2023-09-05),
6. 11721528 - Plasma processing apparatus and control method (2023-08-08),
7. 11705310 - Plasma probe device, plasma processing apparatus, and control method (2023-07-18),
8. 11600475 - Plasma processing apparatus and control method (2023-03-07),
9. 11476088 - Array antenna and plasma processing apparatus (2022-10-18),
10. 11410835 - Plasma density monitor, plasma processing apparatus, and plasma processing method (2022-08-09),
11. 11355326 - Plasma processing apparatus and control method (2022-06-07),
12. 11164730 - Plasma probe device and plasma processing apparatus (2021-11-02),

Title: Mikio Sato: Innovator in Plasma Processing Technology

Introduction

Mikio Sato is a prominent inventor based in Nirasaki, Japan, known for his significant contributions to plasma processing technology. With a total of 12 patents to his name, Sato has made remarkable advancements in the field, particularly in methods and apparatuses that enhance plasma processing efficiency.

Latest Patents

Sato's latest patents include a plasma processing method and a plasma processing apparatus. The plasma processing method involves a chamber equipped with a stage for substrate placement, multiple radiating devices that emit electromagnetic waves, and a dielectric window positioned between the radiating devices and the stage. This innovative method prepares the substrate, controls the phase of the electromagnetic waves, and processes the substrate using localized plasma generated from a supplied gas.

Another notable patent is the plasma measurement method, which focuses on measuring the plasma state using a probe device during substrate processing. This method introduces process gas into a processing container and produces pulsed plasma using an electromagnetic wave pulse. By applying an AC voltage to the pulsed plasma via the probe device, Sato's method allows for the transmission of signals and the measurement of data, including current values, to analyze the state of the pulsed plasma effectively.

Career Highlights

Mikio Sato is currently associated with Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at the company has been instrumental in advancing plasma processing technologies that are crucial for various applications in electronics.

Collaborations

Sato has collaborated with notable coworkers, including Eiki Kamata and Taro Ikeda, who have contributed to his research and development efforts in plasma processing.

Conclusion

Mikio Sato's innovative work in plasma processing technology has established him as a key figure in the field. His patents reflect a deep understanding of plasma dynamics and their applications in modern technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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