The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 18, 2022

Filed:

Jan. 08, 2021
Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Eiki Kamata, Nirasaki, JP;

Taro Ikeda, Nirasaki, JP;

Mikio Sato, Nirasaki, JP;

Nobuhiko Yamamoto, Nirasaki, JP;

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H05H 1/46 (2006.01); H01Q 1/52 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3211 (2013.01); H01J 37/32266 (2013.01); H01Q 1/52 (2013.01); H05H 1/46 (2013.01); H05H 1/463 (2021.05);
Abstract

An array antenna radiates an electromagnetic wave into a chamber of a plasma processing apparatus. The array antenna includes antennas and coupling prevention elements arranged at intervals between the antennas. Each of the coupling prevention elements includes a first member connected to a ceiling wall which is a ground surface in the chamber and a second member connected to a tip end of the first member or a vicinity of the tip end of the first member.


Find Patent Forward Citations

Kamata, Eiki. (2022). Array antenna and plasma processing apparatus (U.S. Patent No. 11476088). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11476088

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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