The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 30, 2024
Filed:
Oct. 21, 2020
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/26 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01); C23C 16/50 (2006.01); C23C 16/52 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32972 (2013.01); C23C 16/50 (2013.01); C23C 16/52 (2013.01); H01J 37/3222 (2013.01); H01L 21/67069 (2013.01); H01L 21/67253 (2013.01); H01L 22/26 (2013.01); H01J 2237/332 (2013.01); H01J 2237/334 (2013.01);
Abstract
A method of controlling a scanning-type plasma processing apparatus using a phased array antenna, includes observing light emission of plasma generated inside a processing container through observation windows provided at multiple positions in the processing container, calculating an in-plane distribution of values representing characteristics of the plasma on a substrate, based on data on the observed light emission of the plasma, and correcting a scanning pattern and/or a plasma density distribution of the plasma based on the calculated in-plane distribution of the values representing the characteristics of the plasma on the substrate.