Michael Murphy

Title: Innovations of Inventor Michael Murphy

Introduction

Michael Murphy is a notable inventor based in Albany, NY, with a remarkable portfolio of nine patents. His work primarily focuses on advanced methods in semiconductor processing and material removal techniques. His innovative approaches have significantly contributed to the field of materials science and engineering.

Latest Patents

One of Michael Murphy's latest patents is titled "Method for removing material overburden via enhanced freeze-less anti-spacer formation using a bilayer system." This method involves patterning a substrate using surface energy differences found in certain fluorinated polymers. The technique promotes surface segregation in a bilayer polymer system, facilitating the fast removal of overburden to expose the anti-spacer region. This process allows for efficient acid diffusion and deprotection, making the polymer mixture developer-soluble.

Another significant patent is related to "Patterning semiconductor features." This method includes forming patterned features on a semiconductor wafer through photolithography. It involves creating first patterned features with specific widths and recesses, followed by anti-spacer patterning processing to form second patterned features. The process culminates in acid diffusion processing to refine the features further, showcasing Murphy's expertise in semiconductor technology.

Career Highlights

Michael Murphy has worked with prominent companies in the semiconductor industry, including Tokyo Electron Limited. His experience in these organizations has allowed him to develop and refine his innovative techniques, contributing to advancements in semiconductor manufacturing processes.

Collaborations

Throughout his career, Michael has collaborated with talented individuals such as Charlotte Cutler and Daniel J Fulford. These collaborations have fostered a creative environment that has led to significant advancements in their respective fields.

Conclusion

Michael Murphy's contributions to the field of innovation and technology are noteworthy. His patents reflect a deep understanding of materials and processes that drive the semiconductor industry forward. His work continues to inspire future innovations in the field.