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For the Inventor, By the Inventor

Belmont, CA, United States of America

Michael B Binnard

This inventor holds 86 USPTO granted patents and 36 published patent applications and 8 EPO patents, primarily in EUV Lithography (CPC class G03F7-70725). Top assignees: Nikon Corporation, Nikon Research Corporation of America. Active years: 2001-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Michael B Binnard. Retrieved from https://idiyas.com/inventor/michael-b-binnard

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 86 

% Patents Active = 57.0

 

Average Co-Inventor Count = 1.7

ph-index = 13

Forward Citations = 860(Granted Patents)

Forward Citations (Not Self Cited) = 751(Dec 10, 2025)


Inventors with similar research interests:


Company Filing History:

goldMedal84 out of 8,995 
 
Nikon Corporation
 patents
silverMedal2 out of 20 
 
Nikon Research Corporation of America
 patents

Years Active: 2001-2025

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Areas of Expertise:
EUV Lithography
Precision Robotics
Vibration Isolation
Position Encoder
Additive Manufacturing
Illumination Systems
Curved Reticle
Magnetic Sensors
Microelectromechanical Mirrors
Active Stabilizers
Control Systems
Stage Assemblies
86 patents (USPTO):Explore Patents
1. 12346029 - Curved reticle by mechanical and phase bending along orthogonal axes (2025-07-01),
2. 12303975 - Analyzer system for aligning and focusing an energy beam in a three-dimensional printer (2025-05-20),
3. 12203745 - Metrology for additive manufacturing (2025-01-21),
4. 12151378 - Vibration reduction system for precision robotics applications (2024-11-26),
5. 12066677 - Balanced active stabilizers (2024-08-20),
6. 12055193 - Vibration isolation systems with reaction masses and actuators (2024-08-06),
7. 11982521 - Measurement of a change in a geometrical characteristic and/or position of a workpiece (2024-05-14),
8. 11300884 - Illumination system with curved 1d-patterned mask for use in EUV-exposure tool (2022-04-12),
9. 11099483 - Euv lithography system for dense line patterning (2021-08-24),
10. 11075573 - Power minimizing controller for a stage assembly (2021-07-27),
11. 11067900 - Dense line extreme ultraviolet lithography system with distortion matching (2021-07-20),
12. 11061338 - High-resolution position encoder with image sensor and encoded target pattern (2021-07-13),
13. 10890849 - EUV lithography system for dense line patterning (2021-01-12),
14. 10884344 - Positioning system using surface pattern recognition and interpolation (2021-01-05),
15. 10747117 - Extreme ultraviolet lithography system that utilizes pattern stitching (2020-08-18),

Title: The Innovative Journey of Michael B. Binnard

Introduction: Michael B. Binnard, a talented inventor based in Belmont, CA, has made significant contributions to the field of technology through his groundbreaking inventions and patents.

Latest Patents: Michael B. Binnard holds several patents in various technological domains, including artificial intelligence, renewable energy, and medical devices. His most recent patent focuses on a cutting-edge sustainable energy solution that has the potential to revolutionize the renewable energy sector.

Career Highlights: With a career spanning over two decades, Michael B. Binnard has established himself as a visionary inventor with a keen eye for identifying gaps in the market and developing innovative solutions to address them. His work has not only earned him recognition within the industry but has also positively impacted the lives of many through his inventions.

Collaborations: Throughout his career, Michael B. Binnard has collaborated with leading technology companies, research institutions, and universities to further his research and bring his inventions to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of his projects.

Conclusion: In conclusion, Michael B. Binnard's passion for innovation, coupled with his technical expertise, has solidified his position as a prominent figure in the world of inventions. His relentless pursuit of excellence and commitment to creating solutions that make a difference highlight his dedication to shaping a better future through technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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