The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 14, 2024
Filed:
Feb. 22, 2018
Nikon Corporation, Tokyo, JP;
Daniel Gene Smith, Tucson, AZ (US);
Michael B. Binnard, Belmont, CA (US);
Nikon Corporation, , JP;
Abstract
A method for measuring a spatial distortion of a target surface (110) of a workpiece (110A). Light is transmitted twice through a reference pattern-generator (104) and impinged upon a workpiece pattern-generator (108). Then, with an optical detector (116), first and second beams formed by the light as a result of interaction with two pattern- generators (104) (106) is acquired to produce a signal characterizing geometry of interference fringes formed at the detector (116) by the first and second beams. Indicia representing at least one of a type and a value of spatial distortion of the target surface (110) is generated and recorded. A system embodying the implementation of the method.