The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2021
Filed:
Jun. 26, 2020
Nikon Corporation, Tokyo, JP;
Michael B. Binnard, Belmont, CA (US);
Abstract
An extreme ultraviolet lithography system () that creates a new pattern () having a plurality of densely packed parallel lines () on a workpiece (), the system () includes a patterning element (); an EUV illumination system () that directs an extreme ultraviolet beam (B) at the patterning element (); a projection optical assembly () that directs the extreme ultraviolet beam diffracted off of the patterning element () at the workpiece () to create a first stripe () of generally parallel lines () during a first scan (); and a control system (). The workpiece () includes an existing pattern () that is distorted. The control system () selectively adjusts a control parameter during the first scan () so that the first stripe () is distorted to more accurately overlay the portion of existing pattern () positioned under the first stripe ().