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Danbury, CT, United States of America

Melissa K Rath

USPTO Granted Patents = 7 (Patent Applications = 2)

EPO Patents = 2 (Patent Applications = 3)

Average Co-Inventor Count = 4.5

ph-index = 4

Forward Citations = 69(Granted Patents)

Location History:

Danbury, CT (US) (2011 - 2016)
Redondo Beach, CA (US) (2016)

Company Filing History:

Advanced Technology Materials, Inc.

Years Active: 2011-2016

where 'Filed Patents' based on already Granted Patents

7 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 9422513 - Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition (2016-08-23),

2. 9256134 - Photoresist removal (2016-02-09),

3. 8951948 - Metal and dielectric compatible sacrificial anti-reflective coating cleaning and removal composition (2015-02-10),

4. 8679734 - Photoresist removal (2014-03-25),

5. 8338087 - Composition and process for post-etch removal of photoresist and/or sacrificial anti-reflective material deposited on a substrate (2012-12-25),

6. 8058219 - Metals compatible post-etch photoresist remover and/or sacrificial antireflective coating etchant (2011-11-15),

7. 7994108 - Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings (2011-08-09),

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