The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 25, 2014
Filed:
Aug. 07, 2012
David W. Minsek, New Milford, CT (US);
Melissa K. Rath, Danbury, CT (US);
David D. Bernhard, Kooskia, ID (US);
Thomas H. Baum, New Fairfield, CT (US);
David W. Minsek, New Milford, CT (US);
Melissa K. Rath, Danbury, CT (US);
David D. Bernhard, Kooskia, ID (US);
Thomas H. Baum, New Fairfield, CT (US);
Advanced Technology Materials, Inc., Danbury, CT (US);
Abstract
Disclosed herein is a composition and method for semiconductor processing. In one embodiment, a wet-cleaning composition for removal of photoresist is provided. The composition comprises a strong base; an oxidant; and a polar solvent. In another embodiment, a method for removing photoresist is provided. The method comprises the steps of applying a wet-cleaning composition comprising about 0.1 to about 30 weight percent strong base; about one to about 30 weight percent oxidant; about 20 to about 95 weight percent polar solvent; and removing the photoresist.