The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 09, 2011
Filed:
Jan. 09, 2006
David W. Minsek, New Milford, CT (US);
Weihua Wang, Fremont, CA (US);
David D. Bernhard, Kooskia, ID (US);
Thomas H. Baum, New Fairfield, CT (US);
Melissa K. Rath, Danbury, CT (US);
David W. Minsek, New Milford, CT (US);
Weihua Wang, Fremont, CA (US);
David D. Bernhard, Kooskia, ID (US);
Thomas H. Baum, New Fairfield, CT (US);
Melissa K. Rath, Danbury, CT (US);
Advanced Technology Materials, Inc., Danbury, CT (US);
Abstract
An aqueous-based composition and process for removing hardened photoresist and/or bottom anti-reflective coating (BARC) material from a microelectronic device having same thereon. The aqueous-based composition includes at least one chaotropic solute, at least one alkaline base, and deionized water. The composition achieves high-efficiency removal of hardened photoresist and/or BARC material in the manufacture of integrated circuitry without adverse effect to metal species on the substrate, such as copper, and without damage to low-k dielectric materials employed in the microelectronic device architecture.