Fremont, CA, United States of America

Weihua Wang


Average Co-Inventor Count = 5.0

ph-index = 2

Forward Citations = 10(Granted Patents)


Location History:

  • Danbury, CT (US) (2008)
  • Fremont, CA (US) (2011)

Company Filing History:


Years Active: 2008-2011

where 'Filed Patents' based on already Granted Patents

2 patents (USPTO):

Title: Innovations of Weihua Wang in Microelectronics

Introduction

Weihua Wang is a notable inventor based in Fremont, CA, who has made significant contributions to the field of microelectronics. With a total of 2 patents, his work focuses on enhancing the efficiency and quality of microelectronic devices.

Latest Patents

One of his latest patents is titled "Composition useful for removal of post-etch photoresist and bottom anti-reflection coatings." This invention presents an aqueous-based composition designed to effectively remove hardened photoresist and/or bottom anti-reflective coating (BARC) material from microelectronic devices. The composition includes at least one chaotropic solute, at least one alkaline base, and deionized water. It achieves high-efficiency removal without adversely affecting metal species on the substrate, such as copper, and without damaging low-k dielectric materials used in microelectronic device architecture.

Another significant patent by Weihua Wang is "Methods and apparatuses for monitoring organic additives in electrochemical deposition solutions." This invention relates to real-time analysis of electrochemical deposition (ECD) metal plating solutions, aimed at reducing plating defects and achieving high-quality metal deposition. It introduces new electrochemical analytical cell designs that minimize cross-contamination and enhance analytical signal strength. The invention also provides improved plating protocols and new methods for simultaneously determining concentrations of suppressor, accelerator, and leveler in ECD solutions.

Career Highlights

Weihua Wang is currently employed at Advanced Technology Materials, Inc., where he continues to innovate in the field of microelectronics. His work has been instrumental in advancing technologies that improve the manufacturing processes of integrated circuits.

Collaborations

He has collaborated with notable colleagues, including David W Minsek and David Daniel Bernhard, contributing to a dynamic research environment that fosters innovation.

Conclusion

Weihua Wang's contributions to microelectronics through his patents and collaborative efforts highlight his role as a key innovator in the industry. His work not only enhances manufacturing processes but also sets a foundation for future advancements in microelectronic technologies.

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