The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2011
Filed:
Oct. 12, 2006
Melissa K. Rath, Danbury, CT (US);
David D. Bernhard, Kooskia, ID (US);
Thomas H. Baum, New Fairfield, CT (US);
Ping Jiang, Danbury, CT (US);
Renjie Zhou, Dayton, NJ (US);
Michael B. Korzenski, Danbury, CT (US);
Melissa K. Rath, Danbury, CT (US);
David D. Bernhard, Kooskia, ID (US);
Thomas H. Baum, New Fairfield, CT (US);
Ping Jiang, Danbury, CT (US);
Renjie Zhou, Dayton, NJ (US);
Michael B. Korzenski, Danbury, CT (US);
Advanced Technology Materials, Inc., Danbury, CT (US);
Abstract
A liquid removal composition and process for removing photoresist and/or sacrificial anti-reflective coating (SARC) material from a microelectronic device having same thereon. The liquid removal composition includes at least one organic quaternary base and at least one surface interaction enhancing additive. The composition achieves at least partial removal of photoresist and/or SARC material in the manufacture of integrated circuitry with minimal etching of metal species on the microelectronic device, such as copper and cobalt, and without damage to low-k dielectric materials employed in the microelectronic device architecture.