Renjie Zhou

Title: Renjie Zhou: Innovator in Microelectronic Device Processing

Introduction

Renjie Zhou is a notable inventor based in Dayton, NJ (US), recognized for his contributions to the field of microelectronics. He holds 2 patents that focus on innovative solutions for photoresist removal processes in microelectronic devices. His work has significantly impacted the manufacturing of integrated circuitry.

Latest Patents

Zhou's latest patents include a liquid removal composition designed for the effective removal of photoresist and sacrificial anti-reflective coating (SARC) materials. This composition features at least one organic quaternary base and one surface interaction enhancing additive. It achieves partial removal of these materials while minimizing etching of metal species, such as copper and cobalt, and avoiding damage to low-k dielectric materials in microelectronic device architecture. Another patent involves low pH compositions for removing hardened photoresist material from microelectronic devices. These compositions include at least one mineral acid and one oxidizing agent, effectively removing hardened photoresist without damaging the underlying silicon-containing layers.

Career Highlights

Throughout his career, Renjie Zhou has worked with prominent companies in the technology sector. He has been associated with Advanced Technology Materials, Inc. and IBM, where he has contributed to various innovative projects in microelectronics.

Collaborations

Zhou has collaborated with several professionals in his field, including Michael B. Korzenski and Melissa K. Rath. Their combined expertise has fostered advancements in microelectronic device processing.

Conclusion

Renjie Zhou's innovative patents and career achievements highlight his significant role in the advancement of microelectronic device technology. His work continues to influence the industry and pave the way for future innovations.