The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 27, 2011
Filed:
May. 01, 2009
Emanuel Cooper, Scarsdale, NY (US);
Julie Cissell, Danbury, CT (US);
Renjie Zhou, Plainsboro, NJ (US);
Michael B. Korzenski, Danbury, CT (US);
George G. Totir, Newtown, CT (US);
Mahmoud Khojasteh, Poughkeepsie, NY (US);
Emanuel Cooper, Scarsdale, NY (US);
Julie Cissell, Danbury, CT (US);
Renjie Zhou, Plainsboro, NJ (US);
Michael B. Korzenski, Danbury, CT (US);
George G. Totir, Newtown, CT (US);
Mahmoud Khojasteh, Poughkeepsie, NY (US);
Advanced Technology Materials, Inc., Danbury, CT (US);
International Business Machines Corp., Armonk, NY (US);
Abstract
A method and low pH compositions for removing bulk and/or hardened photoresist material from microelectronic devices have been developed. The low pH compositions include at least one mineral acid and at least one oxidizing agent. The low pH compositions effectively remove the hardened photoresist material while not damaging the underlying silicon-containing layer(s).
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile