The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2012
Filed:
Mar. 03, 2004
Melissa K. Rath, Danbury, CT (US);
David D. Bernhard, Newtown, CT (US);
David Minsek, New Milford, CT (US);
Michael B. Korzenski, Danbury, CT (US);
Thomas H. Baum, New Fairfield, CT (US);
Melissa K. Rath, Danbury, CT (US);
David D. Bernhard, Newtown, CT (US);
David Minsek, New Milford, CT (US);
Michael B. Korzenski, Danbury, CT (US);
Thomas H. Baum, New Fairfield, CT (US);
Advanced Technology Materials, Inc, Danbury, CT (US);
Abstract
A composition and process for removing photoresist and/or sacrificial anti-reflective coating (SARC) materials from a substrate having such material(s) thereon. The composition includes a base component, such as a quaternary ammonium base in combination with an alkali or alkaline earth base, or alternatively a strong base in combination with an oxidant. The composition may be utilized in aqueous medium, e.g., with chelator, surfactant, and/or co-solvent species, to achieve high-efficiency removal of photoresist and/or SARC materials in the manufacture of integrated circuitry, without adverse effect on metal species on the substrate, such as copper, aluminum and/or cobalt alloys, and without damage to SiOC-based dielectric materials employed in the semiconductor architecture.