This inventor holds 5 USPTO granted patents. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2002-2006.
Location History:
- Hsin-chu, TW (2002 - 2003)
- Sen-Kan, TW (2003)
- Taoyuan, TW (2004 - 2006)
Company Filing History:
Years Active: 2002-2006
Title: Mei-Hui Sung: Innovator in Semiconductor Technology
Introduction
Mei-Hui Sung is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology, particularly in the area of etching processes and dual damascene patterning. With a total of 5 patents to his name, his work has had a substantial impact on the industry.
Latest Patents
One of his latest patents is titled "Zirconium oxide and hafnium oxide etching using halogen containing chemicals." This method describes a process for selectively etching high-k dielectric layers, such as hafnium or zirconium oxide, with a selectivity of greater than 2:1 relative to silicon oxide and polysilicon. The plasma etch chemistry includes various halogen-containing gases and ensures that no etch residues are left behind. Another notable patent is "Multi-purpose composite mask for dual damascene patterning." This invention focuses on forming dual damascene structures using a composite mask that enhances lithographic characteristics while preventing via poisoning.
Career Highlights
Mei-Hui Sung is currently employed at Taiwan Semiconductor Manufacturing Company Ltd. His innovative approaches have led to advancements in semiconductor manufacturing processes, making him a key figure in the industry.
Collaborations
He has collaborated with notable coworkers, including Ming-Huei Lui and Meng-Huei Lui, who have also contributed to the field of semiconductor technology.
Conclusion
Mei-Hui Sung's contributions to semiconductor technology through his patents and innovative methods have established him as a leading inventor in the industry. His work continues to influence advancements in manufacturing processes and materials.