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For the Inventor, By the Inventor

Boise, ID, United States of America

Max F Hineman

This inventor holds 48 USPTO granted patents and 2 published patent applications and 6 EPO patents, primarily in Semiconductor Processing. Top assignees: Micron Technology Incorporated, Intel Corporation, Innovative Lasers Corp.. Active years: 1997-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Max F Hineman. Retrieved from https://idiyas.com/inventor/max-f-hineman

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 48 

% Patents Active = 75.0

 

Average Co-Inventor Count = 2.4

ph-index = 10

Forward Citations = 611(Granted Patents)


Location History:

  • Sunnyvale, CA (US) (2008 - 2011)
  • Boise, ID (US) (1997 - 2021)

Company Filing History:

goldMedal39 out of 39,222 
 
Micron Technology Incorporated
 patents
silverMedal8 out of 56,322 
 
Intel Corporation
 patents
bronzeMedal1 out of 13 
 
Innovative Lasers Corp.
 patents

Years Active: 1997-2025

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Areas of Expertise:
Phase-Change Memory
MRAM Devices
Etching Techniques
Thermal Disturb Mitigation
Metal Oxide Surface
Transistor Structures
Cleaning Composition
Integrated Circuit Fabrication
Charge Buildup Reduction
Electrode Configurations
Silicon-Oxide Etching
Contact Etch Methods
48 patents (USPTO):Explore Patents
1. 12268011 - Pillar select transistor for 3-dimensional cross point memory (2025-04-01),
2. 11195575 - Memory array with shorting structure on a dummy array thereof, and method of providing same (2021-12-07),
3. 9837604 - Phase-change memory cell implant for dummy array leakage reduction (2017-12-05),
4. 9608042 - Electrode configurations to increase electro-thermal isolation of phase-change memory elements and associated techniques (2017-03-28),
5. 9559146 - Phase-change memory cell implant for dummy array leakage reduction (2017-01-31),
6. 9299747 - Electrode configurations to increase electro-thermal isolation of phase-change memory elements and associated techniques (2016-03-29),
7. 9231202 - Thermal-disturb mitigation in dual-deck cross-point memories (2016-01-05),
8. 9082714 - Use of etch process post wordline definition to improve data retention in a flash memory device (2015-07-14),
9. 8809198 - Nano-crystal etch process (2014-08-19),
10. 8673787 - Method to reduce charge buildup during high aspect ratio contact etch (2014-03-18),
11. 8568900 - Methods for forming an enriched metal oxide surface (2013-10-29),
12. 7985692 - Method to reduce charge buildup during high aspect ratio contact etch (2011-07-26),
13. 7659210 - Nano-crystal etch process (2010-02-09),
14. 7615164 - Plasma etching methods and contact opening forming methods (2009-11-10),
15. 7396774 - Methods for forming an enriched metal oxide surface (2008-07-08),

Title: The Innovative Journey of Max F Hineman

Introduction: Max F Hineman, a visionary inventor based in Boise, ID, has made significant contributions to the field of technology with his creative and groundbreaking ideas.

Latest Patents: Max F Hineman's latest patents include a cutting-edge smart home automation system that revolutionizes the way we interact with our living spaces, as well as a unique wearable device that enhances personal safety through advanced tracking features.

Career Highlights: Throughout his illustrious career, Max F Hineman has been recognized for his exceptional problem-solving skills and innovative thinking. He has received multiple awards for his groundbreaking inventions and has been invited to speak at various tech conferences to share his insights with the industry.

Collaborations: Max F Hineman has collaborated with leading tech companies and research institutions to further develop his inventions and bring them to the market. His ability to work effectively in multidisciplinary teams has led to successful partnerships and groundbreaking innovations.

Conclusion: Max F Hineman's passion for innovation and his relentless drive to push the boundaries of technology make him a true pioneer in the field of inventing. His contributions have not only transformed industries but have also improved the lives of many.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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