Company Filing History:
Years Active: 2019-2021
Title: Masayuki Tsukui: Innovator in Vapor Phase Growth Methods
Introduction
Masayuki Tsukui is a notable inventor based in Yokohama, Japan. He has made significant contributions to the field of vapor phase growth methods, holding a total of 3 patents. His work is characterized by innovative techniques that enhance the efficiency and quality of material growth processes.
Latest Patents
Tsukui's latest patents include a vapor phase growth method that involves loading a first substrate into a reaction chamber. This method generates a first mixed gas by combining an indium-containing gas, an aluminum-containing gas, and a nitrogen compound-containing gas. The process forms a first indium aluminum nitride film on the substrate while it is rotated at a speed of 300 rpm or more. Another patent describes a vapor phase growth method for forming a film with a composition different from that of the substrate. This method includes rotating a single substrate, heating it to a specific temperature, and forming a silicon carbide film with a thickness between 10 nm and 200 nm by supplying a first process gas containing silicon and carbon.
Career Highlights
Masayuki Tsukui is currently employed at Nuflare Technology, Inc., where he continues to develop innovative technologies in the field of material growth. His expertise has positioned him as a key figure in advancing vapor phase growth techniques.
Collaborations
Tsukui has collaborated with notable colleagues such as Yasushi Iyechika and Hajime Nago, contributing to various projects that enhance the capabilities of vapor phase growth methods.
Conclusion
Masayuki Tsukui's contributions to vapor phase growth methods reflect his dedication to innovation in material science. His patents and ongoing work at Nuflare Technology, Inc. continue to influence the industry positively.