The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2026
Filed:
Apr. 17, 2023
Applicant:
Nuflare Technology, Inc., Kanagawa, JP;
Inventors:
Masayuki Tsukui, Yokohama, JP;
Yasushi Iyechika, Matsudo, JP;
Kiyotaka Miyano, Tokyo, JP;
Yoshitaka Ishikawa, Yokohama, JP;
Assignee:
NuFlare Technology, Inc., Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/687 (2006.01); C23C 16/455 (2006.01); C23C 16/458 (2006.01); C23C 16/46 (2006.01); C23C 16/48 (2006.01); C30B 25/10 (2006.01);
U.S. Cl.
CPC ...
H01L 21/68785 (2013.01); C23C 16/4586 (2013.01); C23C 16/481 (2013.01); C30B 25/10 (2013.01); C23C 16/45565 (2013.01); C23C 16/4584 (2013.01); C23C 16/46 (2013.01); H01L 21/68735 (2013.01);
Abstract
A vapor phase growth apparatus of embodiments includes: a reactor; a holder provided in the reactor to place a substrate thereon; an annular out-heater provided below the holder; an in-heater provided below the out-heater; a disk-shaped upper reflector provided below the in-heater and formed of pyrolytic graphite; and a disk-shaped lower reflector provided below the upper reflector, formed of silicon carbide, and having a thickness smaller than that of the upper reflector.