Masayuki Nagasawa

This inventor holds 8 USPTO granted patents. Top assignees: Hitachi, Ltd., Renesas Technology Corp.. Active years: 1998-2006.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masayuki Nagasawa. Retrieved from https://idiyas.com/inventor/masayuki-nagasawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 8

% Patents Active = 37.5

Average Co-Inventor Count = 4.1

ph-index = 4

Forward Citations = 68(Granted Patents)

Location History:

Kawagoe, JP (1998 - 2006)
Hitachi, JP (2006)

Company Filing History:

Renesas Technology Corp.

patents

Years Active: 1998-2006

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8 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 7059132 - Steam generator feedwater control system for power plant (2006-06-13),

2. 7026245 - Polishing agent and polishing method (2006-04-11),

3. 6777337 - Planarizing method of semiconductor wafer and apparatus thereof (2004-08-17),

4. 6663468 - Method for polishing surface of semiconductor device substrate (2003-12-16),

5. 6589871 - Processing method, measuring method and producing method of semiconductor devices (2003-07-08),

6. 6565424 - Method and apparatus for planarizing semiconductor device (2003-05-20),

7. 6043155 - Polishing agent and polishing method (2000-03-28),

8. 5772780 - Polishing agent and polishing method (1998-06-30),

Title: Masayuki Nagasawa: Innovator in Power Plant Technology and Semiconductor Polishing

Introduction

Masayuki Nagasawa is a prominent inventor based in Kawagoe, Japan. He holds a total of 8 patents that showcase his contributions to the fields of power plant technology and semiconductor manufacturing. His innovative work has significantly impacted the efficiency and effectiveness of these industries.

Latest Patents

Nagasawa's latest patents include a steam generator feedwater control system for power plants. This system stabilizes the water level in the steam generator and balances the flow rates between steam and feedwater across multiple turbine plants. The control mechanism utilizes detection signals from various units to ensure optimal performance. Another notable patent involves a polishing agent and method that employs a cerium oxide polishing agent, or ceria slurry, to polish insulating films without degrading semiconductor characteristics. This method is particularly effective for fragile inorganic and organic films formed at lower temperatures.

Career Highlights

Throughout his career, Masayuki Nagasawa has worked with leading companies such as Hitachi, Ltd. and Renesas Technology Corporation. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in technology.

Collaborations

Nagasawa has collaborated with notable coworkers, including Yoshio Kawamura and Kan Yasui. Their combined expertise has fostered a creative environment that has led to significant technological advancements.

Conclusion

Masayuki Nagasawa's contributions to power plant technology and semiconductor polishing demonstrate his innovative spirit and dedication to improving industrial processes. His patents reflect a commitment to enhancing efficiency and performance in critical technological areas.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]