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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 5772780 B1

PDFFull Text
Date of Patent:
Jun. 30, 1998

Filed:

Sep. 21, 1995

Polishing agent and polishing method

Applicant:
Inventors:

Yoshio Homma, Hinode-machi, JP;

Kikuo Kusukawa, Fujino-machi, JP;

Shigeo Moriyama, Tama, JP;

Masayuki Nagasawa, Kawagoe, JP;

Assignee:

Hitachi, Ltd., Tokyo, JP;

Attorney:

Antonelli, Terry, Stout, & Kraus, LLP

Primary Examiner:

Jill Warden

Assistant Examiner:

Alexander Markoff

Int. Cl.
CPC ...
B08B / ;
U.S. Cl.
CPC ...
134-7 ; 134 28 ; 134 29 ;
Abstract

An organic insulating film is polished utilizing a polishing agent containing cerium oxide particles (a ceria slurry). The ceria slurry is composed of cerium oxide powder containing a total concentration of Na, Ca, Fe, and Cr of less than 10 ppm. Fragile inorganic and organic insulating films formed at relatively low temperatures can be polished without degrading characteristics of a semiconductor element having such films thereon, due to, e.g., Na diffusion.

Find Patent Forward Citations

Homma, Yoshio. (1998). Polishing agent and polishing method (U.S. Patent No. 5772780). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5772780

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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