Location History:
- Takasago, JP (2015)
- Hyogo, JP (2012 - 2016)
Company Filing History:
5 out of 42 
3 out of 1,887 
1 out of 6 Years Active: 2012-2016
Title: Masaya Ehira: Innovator in Sintering and Sputtering Technologies
Introduction
Masaya Ehira, a prominent inventor based in Hyogo, Japan, has made significant contributions to the field of materials science. With a portfolio of five patents, his innovations primarily revolve around the production of advanced powders and sputtering targets that enhance manufacturing processes.
Latest Patents
Ehira's latest patents reflect his expertise in developing critical materials for various applications. One of his notable inventions is a Cu-In-Ga-Se powder that is designed to prevent cracks during sintering or processing. This powder contains a composition of copper (Cu), indium (In), gallium (Ga), and selenium (Se), with a focus on achieving a stable compound structure.
In addition, he also developed an Al-Ni-La system Al-based alloy sputtering target. This innovation ensures that a significant area of the intermetallic compounds within the alloy meets stringent size criteria, making it suitable for high-performance applications.
Career Highlights
Throughout his career, Masaya Ehira has worked with reputable institutions, including Kobelco Research Institute, Inc. and Kobe Steel, Ltd. His work in these companies has undoubtedly played a crucial role in shaping his innovative approaches to material development.
Collaborations
During his professional journey, Ehira has collaborated with talented individuals like Katsutoshi Takagi and Yuki Iwasaki. These partnerships have allowed for the exchange of ideas and expertise, further enriching his inventive process.
Conclusion
Masaya Ehira continues to push the boundaries of innovation in the field of materials science. Through his patents and collaborative efforts, he contributes significantly to advancements that may pave the way for future technological developments in various industries.