Koshi, Japan

Masato Hayashi

This inventor holds 24 USPTO granted patents and 3 published patent applications, primarily in Substrate Processing. Top assignees: Tokyo Electron Limited, Kawasaki Jukogyo Kabushiki Kaisha, Octec, Inc.. Active years: 2010-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masato Hayashi. Retrieved from https://idiyas.com/inventor/masato-hayashi-owi4v629

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 24 

% Patents Active = 79.2

Average Co-Inventor Count = 3.5

ph-index = 4

Forward Citations = 77(Granted Patents)


Location History:

  • Amagasaki, JP (2010 - 2012)
  • Nirasaki, JP (2013)
  • Kobe, JP (2011 - 2020)
  • Koshi, JP (2017 - 2024)

Company Filing History:


Years Active: 2010-2026

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Areas of Expertise:
Substrate Processing
Abnormality Detection
Foreign Substance Detection
Microstructure Inspection
Temperature Control
Power Storage
Displacement Measurement
Solution Supply
24 patents (USPTO):Explore Patents

Title: Innovations of Masato Hayashi in Chemical Solution Processing

Introduction

Masato Hayashi, based in Koshi, Japan, is a prolific inventor with a remarkable portfolio of 22 patents. His work primarily focuses on advancements in chemical solution processing and substrate technologies. Hayashi's inventions have significantly contributed to the fields of manufacturing and chemical processing, showcasing his innovative spirit and technical expertise.

Latest Patents

Among his latest patents, Hayashi has developed several groundbreaking devices and methods. One of his notable inventions is an **abnormality detection device of chemical solution**. This device is designed to monitor the state of polymers within a chemical solution flowing through a dedicated path. It employs a laser beam to intersect with the flow direction of the chemical solution, with a light receiving element to detect abnormalities in the polymer state. Moreover, his **liquid processing device** and **substrate processing apparatus** reflect his commitment to enhancing precision and efficiency in chemical manufacturing processes. The substrate processing apparatus incorporates a nozzle with a flow rate sensor to determine the proximity of interfering objects, further emphasizing Hayashi's focus on operational safety and efficiency.

Career Highlights

Masato Hayashi's career has been marked by significant contributions to renowned companies such as **Tokyo Electron Limited** and **Kawasaki Jukogyo Kabushiki Kaisha**. His roles in these organizations have allowed him to collaborate on cutting-edge technologies that push the boundaries of chemical processing. The impact of his inventions can be observed in various sectors, enhancing productivity and product quality.

Collaborations

Throughout his career, Hayashi has worked alongside notable colleagues, including Koudai Higashi and Kohei Noguchi. These collaborations have fostered a creative environment, enabling the development of advanced technologies and solutions.

Conclusion

Masato Hayashi's innovations in the realm of chemical solution processing and substrate technology underscore his status as a leading inventor in his field. With a focus on precision, safety, and efficiency, his work continues to influence the manufacturing industry positively. As he develops more patents, the potential for future innovations remains promising, highlighting the enduring importance of intellectual contributions in advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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