Company Filing History:

11 out of 8,889

Nikon Corporation

Siemens Audiologische Technik Gmbh

patents

where one patent can have more than one assignee

Years Active: 1995-2014

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12 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8920569 - Pollutant removal method and apparatus, and exposure method and apparatus (2014-12-30),

2. 8780326 - Exposure apparatus, exposure method, and device manufacturing method (2014-07-15),

3. 7215408 - Specification determining method, projection optical system making method and adjusting method, exposure apparatus and making method thereof, and computer system (2007-05-08),

4. 6961115 - Specification determining method, projection optical system making method and adjusting method, exposure apparatus and making method thereof, and computer system (2005-11-01),

5. 6686989 - Exposure apparatus (2004-02-03),

6. RE37309 - Scanning exposure apparatus (2001-08-07),

7. 6222610 - Exposure apparatus (2001-04-24),

8. 6215808 - Laser apparatus, exposure apparatus, lithography system, method for producing circuit elements, gas supply system and gas supply method (2001-04-10),

9. 6128030 - Semiconductor exposure device (2000-10-03),

10. 5760408 - Semiconductor exposure device (1998-06-02),

11. 5534970 - Scanning exposure apparatus (1996-07-09),

12. 5425045 - Short wavelength laser optical apparatus (1995-06-13),

Title: Masato Hamatani: Innovator in Optical Systems

Introduction

Masato Hamatani is a prominent inventor based in Kounosu, Japan. He has made significant contributions to the field of optical systems, holding a total of 12 patents. His innovative work focuses on methods and apparatuses for pollutant removal and exposure techniques in optical systems.

Latest Patents

Hamatani's latest patents include a pollutant removal method and apparatus, as well as an exposure method and apparatus. The pollutant removal method is designed to quickly eliminate pollutants adhered to optical members in an optical system. This method involves a cylindrical protecting member that facilitates the cleaning of a lens using a wiping cloth soaked in a washing solution containing hydrofluoric acid. The exposure apparatus he developed utilizes a liquid immersion system to expose substrates via an optical member and liquid, enhancing the precision of the exposure process.

Career Highlights

Throughout his career, Hamatani has worked with renowned companies such as Nikon Corporation and Sony Corporation. His experience in these leading organizations has allowed him to refine his skills and contribute to groundbreaking advancements in optical technology.

Collaborations

Hamatani has collaborated with notable professionals in his field, including Toshiharu Nakashima. Their joint efforts have further propelled innovations in optical systems.

Conclusion

Masato Hamatani's contributions to optical systems through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in technology and improve optical system performance.

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