Masashi Shirai

Title: The Innovative Contributions of Masashi Shirai

Introduction

Masashi Shirai is a prominent inventor based in Ube, Japan, known for his significant contributions to the field of semiconductor technology. With a total of 12 patents to his name, Shirai has made remarkable advancements that have impacted various industries.

Latest Patents

Shirai's latest patents include a method of selectively forming a cobalt metal layer using a cobalt compound. This innovative method involves supplying a cobalt compound onto a substrate that includes a wiring line of a late transition metal and an adjacent isolation film. By introducing a reducing gas, Shirai's technique allows for the selective formation of a cobalt metal layer on the wiring line. Another notable patent is his film forming method of SiCN film. This method entails supplying an Si source gas into a processing chamber and subsequently introducing a gas containing a nitriding agent. The use of a compound of nitrogen and carbon as the nitriding agent enables the formation of an SiCN film while maintaining a satisfactory film forming rate, even at lower temperatures.

Career Highlights

Throughout his career, Masashi Shirai has worked with esteemed companies such as Ube Industries, Inc. and Tokyo Electron Limited. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in semiconductor manufacturing.

Collaborations

Shirai has collaborated with notable colleagues, including Toshio Furuya and Hiroshi Nihei. These partnerships have fostered an environment of creativity and innovation, leading to the development of advanced technologies.

Conclusion

Masashi Shirai's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as a key innovator. His work continues to influence the industry and pave the way for future advancements.