Tokyo, Japan

Masashi Fujimoto

This inventor holds 25 USPTO granted patents, primarily in Semiconductor Manufacturing. Top assignees: Nec Electronics Corporation, Nec Corporation, Renesas Electronics Corporation. Active years: 2000-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masashi Fujimoto. Retrieved from https://idiyas.com/inventor/masashi-fujimoto

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 60.0

Average Co-Inventor Count = 1.0

ph-index = 5

Forward Citations = 65(Granted Patents)


Location History:

  • Tokyo, JP (2000 - 2008)
  • Kanagawa, JP (2004 - 2013)

Company Filing History:


Years Active: 2000-2013

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Areas of Expertise:
Pattern Formation
Semiconductor Device
Photomask
Optical Aberration
Image Processing
Wafer Alignment
Phase-Shift Mask
Dual Damascene Process
Reticle System
Exposure Process
Levelling Adjustments
Coherence Factors
25 patents (USPTO):Explore Patents

Title: Innovations in Semiconductor Manufacturing: The Contributions of Masashi Fujimoto

Introduction

Masashi Fujimoto, based in Tokyo, Japan, is a recognized figure in the field of semiconductor technology, holding 25 patents to his name. His work has significantly impacted the methods used in the manufacturing of semiconductor devices, demonstrating his commitment to innovation and advancement in this crucial industry.

Latest Patents

Fujimoto's latest contributions include a series of patents related to a pattern forming method, semiconductor device manufacturing method, and a phase shift photomask featuring dummy gate patterns. His patented method for manufacturing semiconductor devices involves creating multiple gate patterns in parallel within a single circuit block on a semiconductor substrate. This process includes preparing a first photomask, executing a first photolithography step on a photoresist layer, and utilizing a second photomask designed with a trim opening to effectively remove photoresist corresponding to dummy gate patterns. Additionally, his innovative method of forming gate patterns entails the creation of extension gate patterns along with the application of a phase shift photomask to establish phase edges, optimizing the formation of integrated circuit features.

Career Highlights

Throughout his career, Masashi Fujimoto has worked with prominent companies in the technology sector, including NEC Electronics Corporation and NEC Corporation. His contributions to these organizations have been pivotal, pushing the boundaries of current semiconductor manufacturing techniques. His expertise in photolithography and pattern formation has made him an indispensable resource in the innovation of semiconductor production processes.

Collaborations

Fujimoto has collaborated with noted professionals in his field, including Shuichi Hashimoto and Seiji Matsuura. These partnerships have facilitated the exchange of ideas and fostered advancements that have propelled the semiconductor industry forward. The collaborative efforts of such talented individuals contribute to the development of cutting-edge technologies in semiconductor manufacturing.

Conclusion

Masashi Fujimoto stands out as a significant inventor within the semiconductor industry. His 25 patents exemplify his innovative mindset and dedication to enhancing manufacturing processes. Through continuous advancements and collaborations, Fujimoto remains a pivotal player in the evolution of semiconductor technologies, reinforcing the importance of innovation in driving growth within the electronics sector.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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