The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 11, 2011

Filed:

Oct. 05, 2007
Applicant:

Masashi Fujimoto, Kanagawa, JP;

Inventor:

Masashi Fujimoto, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of designing a pattern of a hole pattern having a configuration, in which grid of interval smaller than a minimum permissible pitch according to a design rule for a semiconductor integrated circuit is provided in a pattern drawing, a hole pattern is arranged on a first lattice point which is an intersection of the grid, and, at the same time, other hole patterns are not arranged on a second lattice point group which is on the periphery of the first lattice point, and is adjacent to the first lattice point is provided. And, the number of hole patterns, which may be arranged in a third lattice point group of a plurality of lattice points which are on the periphery of a second lattice point group and are within a predetermined distance from the first lattice point, is controlled.


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