The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 05, 2012
Filed:
Jun. 08, 2010
Applicant:
Masashi Fujimoto, Kanagawa, JP;
Inventor:
Masashi Fujimoto, Kanagawa, JP;
Assignee:
Renesas Electronics Corporation, Kawasaki-shi, Kanagawa, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); G03F 1/00 (2006.01); G03C 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for forming a plurality of gate patterns in parallel with each other on a photoresist layer within a circuit block includes forming extension gate patterns on both ends of the gate patterns and on both ends of a dummy gate pattern of the circuit block to reach an edge of the circuit block, and performing a first photolithography process upon the photoresist layer by using a phase shift photomask having first and second openings whose difference in phase is π, the first and second openings alternating between the gate patterns including the extension gate patterns to form phase edges therein.