The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 28, 2004

Filed:

Apr. 08, 2003
Applicant:
Inventor:

Masashi Fujimoto, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/14763 ;
U.S. Cl.
CPC ...
H01L 2/14763 ;
Abstract

A via hole is opened in an interlayer insulating film , which covers a lower layer interconnect , a protective film is embedded on the base portion of the via hole , and a soluble resin , which dissolves in a resist developing fluid under unexposed conditions, is further embedded thereupon. On this basis, a photoresist is applied, and this photoresist is subjected to an exposure and a development process so as to form a resist pattern , which has an aperture window in a region including the via hole. Upon formation of an interconnective trench in the interlayer insulating film utilizing the resist pattern , a dual damascene structure is formed by embedding a metallic material into the vial hole and interconnective trench.


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