The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 2003

Filed:

Jul. 05, 2000
Applicant:
Inventor:

Masashi Fujimoto, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/358 ; H01L 2/3544 ; A61N 5/00 ; G21G 5/00 ;
U.S. Cl.
CPC ...
H01L 2/358 ; H01L 2/3544 ; A61N 5/00 ; G21G 5/00 ;
Abstract

A reticle comprises a first area including a desired circuit pattern and a second area including alignment marks arranged at specific positions, the first area and the second area being located in an exposure range of an optical exposure apparatus. Each of the alignment marks comprises mark elements arranged to form a first geometric shape. Each of the mark elements has main sub-elements arranged in a specific direction at first pitches to form a second geometric shape, a first auxiliary sub-element located at one end of the second geometric shape, a second auxiliary sub-element located at the other end of the second geometric shape. The first auxiliary sub-element is apart from a first one of the main sub-elements at a second pitch. The second auxiliary sub-element is apart from a second one of the main sub-elements at a third pitch. Each of the main sub-elements is resolvable in the apparatus. Each of the first and second auxiliary sub-elements is irresolvable in the apparatus.


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