Masaru Morita

Title: Masaru Morita: Innovator in Laser Annealing Technology

Introduction

Masaru Morita is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, particularly through his innovative laser annealing methods. With a total of 6 patents to his name, Morita continues to push the boundaries of what is possible in his field.

Latest Patents

Morita's latest patents include a laser annealing method and apparatus. The laser annealing method is designed to form a crystalline semiconductor thin film on the entire surface of a substrate. This method ensures that the uniformity of crystallinity in the seam portion along the long-axis direction of the laser light is not compromised. The resulting crystalline semiconductor thin film exhibits excellent properties and high uniformity, making the seam portion visually unrecognizable.

Additionally, his laser annealing apparatus addresses the issue of irradiation unevenness caused by the refraction phenomenon of laser light due to temperature fluctuations in inert gas. This apparatus includes a gas supply unit that provides inert gas to the laser irradiation area and a gas temperature controller that regulates the temperature of the inert gas. By minimizing the temperature difference between the inert gas and the surrounding atmosphere, the apparatus enhances the quality of the laser light used in the process.

Career Highlights

Masaru Morita is currently associated with IHI Corporation, where he applies his expertise in laser technology to advance semiconductor manufacturing processes. His work has been instrumental in improving the efficiency and effectiveness of laser annealing techniques.

Collaborations

Throughout his career, Morita has collaborated with notable colleagues, including Norihito Kawaguchi and Ryusuke Kawakami. These collaborations have further enriched his research and development efforts in the field of semiconductor technology.

Conclusion

Masaru Morita's innovative contributions to laser annealing technology have positioned him as a key figure in the semiconductor industry. His patents reflect a commitment to enhancing the quality and efficiency of semiconductor manufacturing processes.