The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 14, 2012
Filed:
Jun. 12, 2008
Norihito Kawaguchi, Tokyo, JP;
Ryusuke Kawakami, Tokyo, JP;
Kenichiro Nishida, Tokyo, JP;
Miyuki Masaki, Tokyo, JP;
Masaru Morita, Tokyo, JP;
Atsushi Yoshinouchi, Tokyo, JP;
Norihito Kawaguchi, Tokyo, JP;
Ryusuke Kawakami, Tokyo, JP;
Kenichiro Nishida, Tokyo, JP;
Miyuki Masaki, Tokyo, JP;
Masaru Morita, Tokyo, JP;
Atsushi Yoshinouchi, Tokyo, JP;
IHI Corporation, Tokyo, JP;
Abstract
In laser annealing using a solid state laser, a focus position of a minor axial direction of a rectangular beam is easily corrected depending on positional variation of a laser irradiated portion of a semiconductor film. By using a minor-axis condenser lenscondensing incident light in a minor axial direction and a projection lensprojecting light, which comes from the minor-axis condenser lens, onto a surface of a semiconductor film, laser beamis condensed on the surface of the semiconductor filmin the minor axial direction of a rectangular beam. The positional variation of a vertical direction of the semiconductor filmin a laser irradiated portion of the semiconductor filmis detected by a positional variation detector, and the minor-axis condenser lensis moved in an optical axis direction based on a value of the detection.