The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2013
Filed:
Jun. 17, 2009
Norihito Kawaguchi, Tokyo, JP;
Ryusuke Kawakami, Tokyo, JP;
Kenichiro Nishida, Tokyo, JP;
Jun Izawa, Tokyo, JP;
Miyuki Masaki, Tokyo, JP;
Masaru Morita, Tokyo, JP;
Norihito Kawaguchi, Tokyo, JP;
Ryusuke Kawakami, Tokyo, JP;
Kenichiro Nishida, Tokyo, JP;
Jun Izawa, Tokyo, JP;
Miyuki Masaki, Tokyo, JP;
Masaru Morita, Tokyo, JP;
IHI Corporation, Tokyo, JP;
Abstract
A laser annealing apparatus is provided that is capable of reducing irradiation unevenness of laser light caused by a refraction phenomenon of the laser light due to fluctuation in the temperature of inert gas. The laser annealing apparatus includes a gas supply unit for supplying inert gas G to at least a laser irradiation area of a workpiece, and a gas temperature controller for regulating the temperature of the inert gas G. The gas temperature controller controls the temperature of the inert gas G supplied to the laser irradiation area so as to decrease a temperature difference between the temperature of the inert gas G and the atmospheric temperature of a space (a room R) that is disposed outside the supply area of the inert gas so the temperature controlled inert gas surrounds the optical path of the laser light.