Company Filing History:

13 out of 10,341

Tokyo Electron Limited

patents

3 out of 85

Tokyo Electron Kyushu Limited

where one patent can have more than one assignee

Years Active: 1991-2013

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13 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8372480 - Coater/developer, method of coating and developing resist film, and computer readable storing medium (2013-02-12),

2. 8015940 - Coater/developer, method of coating and developing resist film, and computer readable storing medium (2011-09-13),

3. 6834210 - Substrate processing system and substrate processing method (2004-12-21),

4. 6526329 - Substrate processing system and substrate processing method (2003-02-25),

5. 6507770 - Substrate processing system and substrate processing method (2003-01-14),

6. 6457882 - Substrate processing method and substrate processing apparatus (2002-10-01),

7. 6394670 - Parts maintenance managing system (2002-05-28),

8. RE37470 - Substrate processing apparatus and substrate processing method (2001-12-18),

9. 6054181 - Method of substrate processing to form a film on multiple target objects (2000-04-25),

10. 5725664 - Semiconductor wafer processing apparatus including localized (1998-03-10),

11. 5664254 - Substrate processing apparatus and substrate processing method (1997-09-02),

12. 5565034 - Apparatus for processing substrates having a film formed on a surface of (1996-10-15),

13. 5061144 - Resist process apparatus (1991-10-29),

Title: Masanori Tateyama: Innovator in Coating and Developing Technologies

Introduction

Masanori Tateyama is a prominent inventor based in Kumamoto-ken, Japan. He has made significant contributions to the field of coating and developing technologies, holding a total of 13 patents. His work has been instrumental in advancing processes that enhance the efficiency and effectiveness of substrate handling in various applications.

Latest Patents

Among his latest patents is a coater/developer, which includes a method of coating and developing resist film. This innovative technology involves producing a transfer flow in accordance with a process recipe. The transfer flow associates a type of modules with a necessary staying time, which is crucial for the substrate transfer process. The cycle limiting time is determined based on the longest necessary transfer cycle time, ensuring optimal performance. The number of modules used is calculated to maximize efficiency, demonstrating Tateyama's commitment to innovation in this field.

Career Highlights

Masanori Tateyama has worked with notable companies such as Tokyo Electron Limited and Tokyo Electron Kyushu Limited. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the semiconductor industry. His expertise in coating and developing processes has positioned him as a key figure in the advancement of these technologies.

Collaborations

Throughout his career, Tateyama has collaborated with talented individuals, including Naruaki Iida and Yasuhiro Sakamoto. These collaborations have fostered an environment of innovation and creativity, leading to the development of cutting-edge technologies.

Conclusion

Masanori Tateyama's contributions to the field of coating and developing technologies are noteworthy. His patents and career achievements reflect his dedication to innovation and excellence. As a leading inventor, he continues to influence the industry with his groundbreaking work.

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