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For the Inventor, By the Inventor

Tokyo, Japan

Masanaga Fukasawa

This inventor holds 20 USPTO granted patents and 7 published patent applications, primarily in Semiconductor Devices. Top assignees: Sony Corporation, Sony Semiconductor Solutions Corporation, Sony Electronics Inc. Active years: 2002-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masanaga Fukasawa. Retrieved from https://idiyas.com/inventor/masanaga-fukasawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 20 

% Patents Active = 85.0

Average Co-Inventor Count = 1.5

ph-index = 6

Forward Citations = 98(Granted Patents)


Location History:

  • Fishkill, NY (US) (2007 - 2013)
  • Tokyo, JP (2014 - 2023)
  • Kanagawa, JP (2002 - 2024)

Company Filing History:

goldMedal15 out of 58,148 
 
Sony Corporation
 patents
silverMedal5 out of 3,320 
 
Sony Semiconductor Solutions Corporation
 patents
bronzeMedal2 out of 2,335 
 
Sony Electronics Inc
 patents
where one patent can have more than one assignee

Years Active: 2002-2026

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Areas of Expertise:
Display Device
Etching Method
Oxide Semiconductor
Solid-State Imaging
Integrated Circuit
Carbon Nanotube
Low Dielectric Films
Interconnection Layer
Porous Low K Layer
Ultraviolet Ray Damage
Semiconductor Manufacturing
20 patents (USPTO):Explore Patents
1. 12750929 - Display device and electronic apparatus (2026-09-29),
2. 12074030 - Etching method of oxide semiconductor film, oxide semiconductor workpiece, and electronic device (2024-08-27),
3. 12062548 - Etching method for oxide semiconductor film (2024-08-13),
4. 11798965 - Solid-state imaging device and method for manufacturing the same (2023-10-24),
5. 11017987 - Etching method and etching processing apparatus (2021-05-25),
6. 10804313 - Semiconductor device and solid-state imaging device (2020-10-13),
7. 10504839 - Semiconductor device and manufacturing method of the same (2019-12-10),
8. 10157837 - Semiconductor device and manufacturing method of the same (2018-12-18),
9. 10026769 - Semiconductor device and solid-state imaging device (2018-07-17),
10. 9859214 - Semiconductor device and manufacturing method of the same (2018-01-02),
11. 9627359 - Semiconductor device and manufacturing method of the same (2017-04-18),
12. 9425142 - Semiconductor device and manufacturing method of the same (2016-08-23),
13. 9293411 - Semiconductor device and manufacturing method of the same (2016-03-22),
14. 9287097 - Predicting ultraviolet ray damage with visible wavelength spectroscopy during a semiconductor manufacturing process (2016-03-15),
15. 8871633 - Semiconductor device and manufacturing method of the same (2014-10-28),

Title: Masanaga Fukasawa: Pioneering Inventor from Tokyo

Introduction: Masanaga Fukasawa is a renowned inventor hailing from Tokyo, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Fukasawa's latest patents include advancements in robotics, artificial intelligence, and sustainable energy solutions, showcasing his commitment to creating a more efficient and sustainable future.

Career Highlights: With a career spanning over two decades, Fukasawa has worked with leading tech companies in Japan, spearheading research and development projects that have led to significant technological advancements in various industries.

Collaborations: Throughout his career, Fukasawa has collaborated with top researchers, engineers, and scientists both in Japan and internationally, fostering a culture of innovation and knowledge-sharing to push the boundaries of what is possible in the world of technology.

Conclusion: Masanaga Fukasawa's relentless pursuit of innovation and his passion for creating cutting-edge solutions have solidified his reputation as a visionary inventor in Tokyo and beyond.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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