The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2021
Filed:
Jul. 03, 2018
Applicant:
Sony Semiconductor Solutions Corporation, Kanagawa, JP;
Inventor:
Masanaga Fukasawa, Tokyo, JP;
Assignee:
SONY SEMICONDUCTOR SOLUTIONS CORPORATION, Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32926 (2013.01); H01J 37/3299 (2013.01); H01J 37/32954 (2013.01); H01J 37/32972 (2013.01); H01L 21/31116 (2013.01);
Abstract
An etching method includes inputting, to a setting unit, at least electric power, a pressure, and a gas flow rate, performing etching processing in a chamber, on the basis of a value inputted to the setting unit, and calculating an ion energy distribution mathematical function, by using a measured value upon the etching processing.