The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 27, 2024
Filed:
Apr. 10, 2019
Applicant:
Sony Semiconductor Solutions Corporation, Kanagawa, JP;
Inventors:
Akiko Hirata, Kanagawa, JP;
Masanaga Fukasawa, Kanagawa, JP;
Assignee:
SONY SEMICONDUCTOR SOLUTIONS CORPORATION, Kanagawa, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/3065 (2006.01); H01L 21/30 (2006.01); H01L 21/465 (2006.01); H01L 29/24 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3065 (2013.01); H01L 21/30 (2013.01); H01L 21/465 (2013.01); H01L 29/24 (2013.01);
Abstract
A first etching method of an oxide semiconductor film according to an embodiment of the present disclosure includes: forming a reduction layer in an oxide semiconductor film with use of a reducing gas; and sputtering the reduction layer with use of a rare gas.
Quick Actions:
Hirata, Akiko. (2024). Etching method of oxide semiconductor film, oxide semiconductor workpiece, and electronic device (U.S. Patent No. 12074030). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12074030
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile