Company Filing History:

11 out of 1,100

Shin-etsu Handotai Co., Ltd.

Years Active: 1991-2003

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15 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6503363 - System for reducing wafer contamination using freshly, conditioned alkaline etching solution (2003-01-07),

2. 6110839 - Method of purifying alkaline solution and method of etching (2000-08-29),

3. 5983907 - Method of drying semiconductor wafers using hot deionized water and (1999-11-16),

4. 5972802 - Prevention of edge stain in silicon wafers by ozone dipping (1999-10-26),

5. 5951374 - Method of polishing semiconductor wafers (1999-09-14),

6. 5893982 - Prevention of edge stain in silicon wafers by oxygen annealing (1999-04-13),

7. 5759087 - Method for inducing damage for gettering to single crystal silicon wafer (1998-06-02),

8. 5665168 - Method for cleaning semiconductor silicon wafer (1997-09-09),

9. 5662743 - Method of cleaning silicon wafers in cleaning baths with controlled (1997-09-02),

10. 5640238 - Method of inspecting particles on wafers (1997-06-17),

11. 5626681 - Method of cleaning semiconductor wafers (1997-05-06),

12. 5581837 - Brush cleaning apparatus and cleaning system for disk-shaped objects (1996-12-10),

13. 5494862 - Method of making semiconductor wafers (1996-02-27),

14. 5447890 - Method for production of wafer (1995-09-05),

15. 5007071 - Method of inspecting bonded wafers (1991-04-09),

Title: Innovations of Masami Nakano

Introduction

Masami Nakano is a prominent inventor based in Vancouver, WA (US), known for his significant contributions to the field of semiconductor technology. With a total of 15 patents to his name, Nakano has developed innovative solutions that enhance the efficiency and quality of semiconductor manufacturing processes.

Latest Patents

Among his latest patents is a "System for reducing wafer contamination using freshly conditioned alkaline etching solution." This system is designed to condition an alkaline etching solution, which is crucial for reducing contamination during the silicon wafer etching process. It includes a conditioning tank for mixing the solution, a conditioning chemical introduction system, and a buffer tank for storing the conditioned solution before use. Another notable patent is the "Method of purifying alkaline solution and method of etching." This method involves dissolving metallic silicon and/or silicon compounds in an alkaline solution to purify it, significantly decreasing metallic ions at a low cost. The etching method ensures that the quality of semiconductor wafers is maintained without deterioration in the characteristics of the semiconductor devices.

Career Highlights

Throughout his career, Nakano has worked with esteemed companies such as Shin-Etsu Handotai Co., Ltd. and SEH America, Inc. His experience in these organizations has allowed him to refine his expertise in semiconductor technologies and contribute to advancements in the industry.

Collaborations

Masami Nakano has collaborated with notable professionals in his field, including Isao Uchiyama and Hisashi Masumura. These collaborations have further enriched his work and led to innovative developments in semiconductor manufacturing.

Conclusion

Masami Nakano's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence the field, ensuring advancements in the quality and efficiency of semiconductor manufacturing processes.

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