The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 1999
Filed:
Oct. 07, 1997
Applicant:
Inventors:
Masami Nakano, Vancouver, WA (US);
Jim Woodling, Vancouver, WA (US);
Assignee:
SEH America, Inc., Vancouver, WA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L / ; H01L / ;
U.S. Cl.
CPC ...
438770 ; 438476 ; 438959 ; 438974 ; 134902 ;
Abstract
A method of preventing edge stain in silicon wafers from the edge polishing step with an alkaline slurry, the method consisting of formation of an oxide layer by an ozone dipping step prior to edge polishing.
Nakano, Masami. (1999). Prevention of edge stain in silicon wafers by ozone dipping (U.S. Patent No. 5972802). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5972802
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile