Osaka, Japan

Masahiro Ogawa

This inventor holds 24 USPTO granted patents and 9 published patent applications, primarily in Nitride Semiconductors. Top assignees: Panasonic Corporation, Matsushita Electric Industrial Co., Ltd., Panasonic Holdings Corporation. Active years: 2003-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Masahiro Ogawa. Retrieved from https://idiyas.com/inventor/masahiro-ogawa-5mfvok8z

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 24 

% Patents Active = 70.8

Average Co-Inventor Count = 3.4

ph-index = 7

Forward Citations = 126(Granted Patents)


Location History:

  • Higashiosaka, JP (2003 - 2004)
  • Osaka, JP (2003 - 2024)

Company Filing History:


Years Active: 2003-2025

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Areas of Expertise:
Nitride Semiconductor Device
Semiconductor Relay
Video Image Pickup Device
Image Encoder
Camera System
Phase Adjusting Device
Image Sensor
Digital Camera
Semiconductor Substrate
Manufacturing Method
Compound Semiconductor Wafer
High Performance Semiconductor
24 patents (USPTO):Explore Patents

Title: Masahiro Ogawa: A Pioneer in Nitride Semiconductor Innovations

Introduction: Masahiro Ogawa is a prominent inventor based in Osaka, Japan, known for his significant contributions to the field of nitride semiconductor devices. With an impressive portfolio of 22 patents, Ogawa has established himself as a key figure in semiconductor technology.

Latest Patents: Among his latest innovations, Ogawa has developed a nitride semiconductor device that comprises several critical components. This device includes a substrate and a first nitride semiconductor layer of a first conductivity located above the substrate. A second nitride semiconductor layer, differing in conductivity, is positioned above the first layer, along with a unique opening that penetrates through the second layer. This innovative design features an electron transport layer and an electron supply layer arranged sequentially along the inner surfaces of the opening. It also incorporates a gate electrode situated above the electron supply layer, a source electrode connected to both the electron supply layer and the electron transport layer, and a drain electrode found on the substrate's opposite surface. Notably, a portion of the second nitride semiconductor layer is maintained at a different potential than that of the source electrode.

Another recent patent from Ogawa includes a variation of a nitride semiconductor device, which introduces a substrate, an n-type drift layer, and a p-type blocking layer. This design features a gate opening penetrating through the blocking layer to the drift layer, along with an electron transport layer and an electron supply layer on the gate opening's inner face. The gate electrode, positioned above the electron supply layer, covers the gate opening, while a source opening passes through the electron supply and transport layers to the blocking layer. The source electrode is integrated with the source opening, ensuring a connection to the underlying layers, and a drain electrode is situated on the opposite side of the substrate.

Career Highlights: Masahiro Ogawa has had an impactful career, having worked with leading companies in the electronics and semiconductor industries. Notable among these are Panasonic Corporation and Matsushita Electric Industrial Co., Ltd. His work has enabled advancements in semiconductor technologies, particularly in enhancing the functionality and efficiency of nitride devices.

Collaborations: Throughout his career, Ogawa has collaborated with distinguished colleagues in the field. Notable coworkers include Masahiro Ishida and Masaaki Yuri, with whom he has shared knowledge and driven innovation in semiconductor research and development.

Conclusion: Masahiro Ogawa's contributions to the nitride semiconductor industry exemplify the importance of innovation and collaboration in technology. His 22 patents reflect a dedication to advancing semiconductor devices, impacting various applications and paving the way for future innovations in the field.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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