Masahiro Murata

Title: Masahiro Murata: Innovator in Film Deposition Technology

Introduction

Masahiro Murata is a prominent inventor based in Iwate, Japan. He has made significant contributions to the field of film deposition technology, holding a total of 8 patents. His innovative methods have advanced the capabilities of film deposition processes, particularly in semiconductor manufacturing.

Latest Patents

Murata's latest patents include a film deposition method and a film deposition apparatus designed to fill recessed patterns formed on substrate surfaces. In one of his methods, an adsorption blocking group is created by adsorbing chlorine gas activated by plasma onto the substrate's top surface and the upper portion of the recessed pattern. A source gas containing silicon or a metal, along with chlorine, is then adsorbed on the lower portion of the recessed pattern where the blocking group is absent. This process allows for the deposition of a molecular layer of a nitride film through a reaction with a nitriding gas. Another of his methods focuses on filling a recessed pattern with a silicon nitride (SiN) film, utilizing a cyclic process involving the adsorption of NH groups and subsequent conversion to N groups.

Career Highlights

Throughout his career, Masahiro Murata has worked with notable companies, including Tokyo Electron Limited. His expertise in film deposition technology has positioned him as a key figure in the industry, contributing to advancements that enhance manufacturing processes.

Collaborations

Murata has collaborated with esteemed colleagues such as Hitoshi Kato and Shigehiro Miura. Their combined efforts have furthered the development of innovative technologies in the field.

Conclusion

Masahiro Murata's contributions to film deposition technology exemplify his dedication to innovation and excellence. His patents and collaborative efforts continue to influence the semiconductor industry, showcasing the importance of inventive minds in advancing technology.