Joetsu, Japan

Masahiro Kanayama


 

Average Co-Inventor Count = 4.2

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 2022-2025

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7 patents (USPTO):

As I specialize in innovations, inventions, inventors, patent attorneys, assignees and patents, I will create an article about inventor Masahiro Kanayama based on the provided data.

Title: Unveiling the Innovations of Masahiro Kanayama

Introduction: Masahiro Kanayama, a talented inventor from Joetsu, Japan, has made significant contributions to the field of silicon-containing resist underlayer films and patterning processes. With a total of 5 patents to his name, Kanayama's work at Shin-Etsu Chemical Co., Ltd. showcases his expertise and innovative spirit.

Latest Patents: One of Kanayama's latest patents involves a composition for forming a silicon-containing resist underlayer film. This composition includes a thermosetting silicon-containing material and a compound that allows for enhanced sensitivity of the upper layer resist while maintaining low line-width roughness. Another patent focuses on a thermosetting iodine- and silicon-containing material for EUV lithography, offering advancements in resist underlayer film formation and patterning processes.

Career Highlights: Kanayama's career highlights revolve around his cutting-edge research and development in the realm of materials science and lithography. His innovative approaches to improving resist underlayer films have gained recognition in the industry, positioning him as a key player in pushing the boundaries of technology.

Collaborations: Throughout his journey, Kanayama has collaborated with esteemed colleagues such as Tsutomu Ogihara and Yusuke Biyajima. Together, they have worked diligently to bring forth novel solutions and advancements in the field of silicon-containing materials for lithography applications.

Conclusion: In conclusion, Masahiro Kanayama stands as a beacon of innovation in the world of materials science and lithography. His patented inventions and collaborative efforts underscore his dedication to pushing the boundaries of technology and shaping the future of the industry.

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