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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12174541 B1

PDFFull Text
Date of Patent:
Dec. 24, 2024

Filed:

Mar. 16, 2023

Composition for forming silicon-containing resist underlayer film and patterning process

Applicant:

Shin-etsu Chemical Co., Ltd., Tokyo, JP;

Inventors:

Tsutomu Ogihara, Joetsu, JP;

Yusuke Biyajima, Joetsu, JP;

Masahiro Kanayama, Joetsu, JP;

Assignee:

SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;

Attorney:

Oliff PLC

Primary Examiner:

Daborah Chacko-Davis

Int. Cl.
CPC ...
C08G 77/18 (2006.01); C08G 77/26 (2006.01); C09D 183/06 (2006.01); C09D 183/08 (2006.01); G03F 7/00 (2006.01); G03F 7/11 (2006.01); H01L 21/027 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01); G03F 7/40 (2006.01); H01L 21/308 (2006.01); H01L 21/311 (2006.01); H01L 21/3213 (2006.01);
U.S. Cl.
CPC ...
G03F 7/11 (2013.01); C08G 77/18 (2013.01); C08G 77/26 (2013.01); C09D 183/06 (2013.01); C09D 183/08 (2013.01); G03F 7/70383 (2013.01); H01L 21/0274 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2006 (2013.01); G03F 7/2041 (2013.01); G03F 7/325 (2013.01); G03F 7/38 (2013.01); G03F 7/40 (2013.01); H01L 21/3081 (2013.01); H01L 21/3086 (2013.01); H01L 21/31138 (2013.01); H01L 21/32139 (2013.01);
Abstract

A composition for forming a silicon-containing resist underlayer film includes: a thermosetting silicon-containing material containing any one or more of a partial structure shown by the general formula (Sx-1), (Sx-2), and (Sx-3); and a compound shown by the general formula (P-0), where Rrepresents an organic group that has or generates a silanol group, a hydroxy group, or a carboxy group; Rand Rare each independently the same as Ror each represent a hydrogen atom or a monovalent substituent having 1 to 30 carbon atoms; Rrepresents a divalent organic group substituted with a fluorine atom; Rand Reach independently represents a monovalent hydrocarbon group having 1 to 20 carbon atoms; Rrepresents a divalent hydrocarbon group having 1 to 20 carbon atoms; and Lrepresents a single bond or a divalent hydrocarbon group having 1 to 20 carbon atoms.

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